Tetramethyldisiloxane. Synonym: 1,1,3,3-Tetramethyl-disiloxane; 1,3-Dihydrotetramethyldisiloxane, Countertype of Wacker Siloxane HSi2
SiSiB® PC9400 is used in for Plasma Enhanced Chemical Vapor Deposition (PECVD) of glass on a variety of substrates at low temperature.
SiSiB® PC9400 is also employed in reductive halogenation of aldehydes and epoxides.